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1
(A) study on the ruthenium thin films formed by atomic layer deposition (ALD) = ALD 증착법으로 형성된 ruthenium 박막의 특성에 관한 연구link

Kwon, Oh-Kyum; 권오겸; et al, 한국과학기술원, 2004

2
Enhancement of Iodine Adsorption Using I2 Plasma for Seedless Catalyst-Enhanced CVD of Copper

Kwon, Oh-Kyum; Kim, Jae-Hoon; Park, Hyoung-Sang; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.6, no.8, pp.109 - 111, 2003-06

3
Improvement of the morphological stability by stacking RuO2 on ru thin films with atomic layer deposition

Kwon, Se-Hun; Kwon, Oh-Kyum; Kim, Jae-Hoon; Jeong, Seong-Jun; Kim, Sung-Wook; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.154, no.9, pp.H773 - H777, 2007

4
Initial stages of ruthenium film growth in plasma-enhanced atomic layer deposition

Kwon, Se-Hun; Kwon, Oh-Kyum; Kim, Jin-Hyock; Oh, Heung-Ryong; Kim, Kwang-Ho; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.5, pp.H296 - H300, 2008-03

5
(The) effect of $H_2$ plasma treatment on the film growth rate in catalytic-enhanced Cu CVD = 촉매를 이용한 Cu CVD의 증착속도에 대한 수소 플라즈마의 효과 연구link

Kwon, Oh-Kyum; 권오겸; et al, 한국과학기술원, 2001

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