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(A) study on the ald modeling for process design of multi-component thin films = 다성분계박막 공정설계를 위한 원자층증착법 모델링에 대한 연구link Chung, Hoi-Sung; 정회성; et al, 한국과학기술원, 2008 |
(A) study on the plasma-enhanced atomic layer deposition of TaN thin films = Peald 법으로 증착된 TaN 박막 특성에 관한 연구link Chung, Hoi-Sung; 정회성; et al, 한국과학기술원, 2004 |
Plasma-enhanced atomic layer deposition of TaN thin films using tantalum-pentafluoride and N-2/H-2/Ar plasma Chung, Hoi-Sung; Kwon, Jung-Dae; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.11, pp.C751 - C754, 2006 |
TiO2/Al2O3/TiO2 nanolaminated thin films for DRAM capacitor deposited by plasma-enhanced atomic layer deposition Jeon, Woojin; Chung, Hoi-Sung; Joo, Daekwon; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.2, pp.H19 - H21, 2008 |
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