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Effect of Gas Composition on TiN Thin-Film Fabrication in N2/H2/Ar/TiCl4 Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition System Jang, SS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS, v.40, no.8, pp.4819 - 4824, 2001-08 |
In situ diagnosis of chemical species for the growth of carbon nanotubes in microwave plasma-enhanced chemical vapor deposition Woo, YS; Jeon, DukYoung; Han, IT; Lee, NS; Jung, JE; Kim, JM, DIAMOND AND RELATED MATERIALS, v.11, no.1, pp.59 - 66, 2002-01 |
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