Showing results 6 to 8 of 8
Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals Kwon, SH; Kwon, OK; Min, JS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.6, pp.G578 - G581, 2006 |
Promotion of topologically close-packed phases in a Ru-containing Ni-based superalloy Lee, Sangwon; Do, Jeonghyeon; Jang, Kyuseon; Jun, Hosun; Park, Yejun; Choi, Pyuck-Pa, SCRIPTA MATERIALIA, v.222, 2023-01 |
Thermal stability of RuO2 thin films prepared by modified atomic layer deposition Kim, Jin-Hyock; Ahn, Ji-Hoon; Kang, Sang-Won; Roh, Jae-Sung; Kwon, Se-Hun; Kim, Ja-Yong, CURRENT APPLIED PHYSICS, v.12, pp.S160 - S163, 2012-09 |
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