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MICROSTRUCTURE OF THE EMITTER POLYCRYSTALLINE SILICON SILICON INTERFACE IN BIPOLAR-TRANSISTORS AFTER RAPID THERMAL ANNEALING KIM, Y; LIU, TM; LEE, KF; Jeon, DukYoung; OURMAZD, A, APPLIED PHYSICS LETTERS, v.60, no.4, pp.437 - 438, 1992-01 |
SCALING THE SI METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR INTO THE 0.1-MU-M REGIME USING VERTICAL DOPING ENGINEERING YAN, RH; OURMAZD, A; LEE, KF; Jeon, DukYoung; PINTO, MR, APPLIED PHYSICS LETTERS, v.59, no.25, pp.3315 - 3317, 1991-12 |
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