Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Title 

Showing results 1641 to 1660 of 19264

1641
Atomic force microscope를 이용한 탐침 정보 저장용 PZT 박막의 조성에 따른 도메인 특성 분석 = Domain characterization of PZT thin films using atomic force microscope for probe based data storagelink

김윤석; Kim, Yun-Seok; 노광수; 배병수; et al, 한국과학기술원, 2004

1642
Atomic Layer Deposiion of Ruthenium and Ruthenium Oxide for DRAM Capacitor Electrode

Kang, Sang-Won, 4th AVS International Conference on Microelectronics and Interfaces, ICMI, 2003-03

1643
Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning

Moon, Hyoung Seok; Kim, Juyoung; Jin, Hyeong Min; Lee, Woo Jae; Choi, Hyeon Jin; Mun, Jeong Ho; Choi, Young Joo; et al, ADVANCED FUNCTIONAL MATERIALS, v.24, no.27, pp.4343 - 4348, 2014-07

1644
Atomic layer deposition assisted sacrificial template synthesis of mesoporous TiO2 electrode for high performance lithium ion battery anodes

Hong, Ki Joo; Kim, Sang Ouk, ENERGY STORAGE MATERIALS, v.2, pp.27 - 34, 2016-01

1645
Atomic Layer Deposition Encapsulated Activated Carbon Electrodes for High Voltage Stable Supercapacitors

Hong, Ki Joo; Cho, Moonkyu; Kim, Sang-Ouk, ACS APPLIED MATERIALS INTERFACES, v.7, no.3, pp.1899 - 1906, 2015-01

1646
Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol

Jeon, WS; Yang, S; Lee, CS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.6, pp.306 - 310, 2002-06

1647
Atomic Layer Deposition of Aluminum Thin Films Using an Alternating Supply of Trimethylaluminum and a Hydrogen Plasma

Lee, Yong Ju; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.5, no.10, pp.C91 - C93, 2002-08

1648
Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material

Chang, Siliang; Selvaraj, Sathees Kannan; Choi, Yoon-Young; Hong, Seungbum; Nakhmanson, Serge M.; Takoudis, Christos G., JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.34, no.1, 2016-01

1649
Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

Ahn, Jinseong; Ahn, Changui; Jeon, Seokwoo; Park, Junyong, APPLIED SCIENCES-BASEL, v.9, no.10, pp.1 - 17, 2019-05

1650
Atomic layer deposition of nickel by the reduction of preformed nickel oxide

Chae, Junghun; Park, Hyuong-Sang; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.5, no.6, pp.C64 - C66, 2002-06

1651
Atomic Layer Deposition of Ruthenium Glue Layer for Copper Damascene interconnect

Kang, Sang-Won, 203rd ECS Meeting, ECS, 2003-04

1652
Atomic layer deposition of ruthenium thin films for copper glue layer

Kwon, OK; Kim, JH; Park, HS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.2, pp.G109 - G112, 2004-01

1653
Atomic Layer Deposition of Silicon Nitride Thin Film

Park, Chong-Ook; Lee, Joo-Hyeon; Kim, Hyuk; Lee, Yeon-Seong; Rha, Sa-Kyun; Lee, Won-Jun, AVS Topical Conference ALD 2002, pp.P-14 -, 2002

1654
Atomic layer deposition of silicon oxide thin films by alternating exposures to Si(2)Cl(6) and O(3)

Lee, Seung-Won; Park, Kwangchol; Han, Byeol; Son, Sang-Ho; Rha, Sa-Kyun; Park, Chong-Ook; Lee, Won-Jun, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.7, pp.23 - 26, 2008

1655
Atomic Layer Deposition of TiN Thin Films by Alternate Supply of Tetrakis (ethymethylamino)-Titanium and Ammonia

Min, Jae-Sik; Son, Young-Woong; Kang, Won-Gu; Chun, Soung-Soon; Kang, Sang-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.37, no.0, pp.4999 - 5004, 1999

1656
Atomic layer deposition of TiN thin films by sequential introduction of Ti precursor and NH3

Min Jae-Sik; Son Young-Woong; Kang Won-Gu; Kang Sang-Won, Proceedings of the 1998 MRS Spring Symposium, pp.337 - 342, MRS, 1998-04-13

1657
Atomic Layer Deposition of Two-Dimensional (2D) Bismuth Oxyselenides (Bi2O2Se)

박현빈; 강기범, 제29회 한국반도체학술대회, UNIST, 한국반도체산업협회, 한국반도체연구조합, 2022-01-24

1658
Atomic Layer Deposition of Two-Dimensional Bismuth Oxyselenide

박현빈; 강기범, 제 63회 한국진공학회, 한국진공학회, 2022-08-17

1659
Atomic Layer Deposition of Two-Dimensional Bismuth Oxyselenide

박현빈; 강기범, 한국 그래핀·2차원 소재 심포지엄, 한국그래핀학회, 2022-07-11

1660
Atomic layer deposition(ALD)-functionalized perovskite oxide surface to develop highly active and durable SOFC electrode = 원자층 증착 기법을 이용하여 기능화 된 고 활성 및 고 내구성의 페로브스카이트계 산화물 SOFC 전극 개발link

Seo, Jongsu; Jung, WooChul; et al, 한국과학기술원, 2021

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