Showing results 1 to 8 of 8
APPLICATION OF THE XENON-ADSORPTION METHOD FOR THE STUDY OF METAL CLUSTER FORMATION AND GROWTH ON Y-ZEOLITE Ryoo, Ryong; CHO, SJ; PAK, CH; KIM, JG; Ihm, Son Ki; Lee, JeongYong, JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, v.114, no.1, pp.76 - 82, 1992-01 |
Biocatalytic Photosynthesis with Water as an Electron Donor Ryu, Jungki; Nam, Dong Heon; Lee, Sahng Ha; Park, Chan Beum, CHEMISTRY-A EUROPEAN JOURNAL, v.20, no.38, pp.12020 - 12025, 2014-09 |
Effect of Se modification on RuSey/C electrocatalyst for oxygen reduction with phosphoric acid Park, Hee-Young; Yoo, Sung Jong; Kim, Soo Jin; Lee, Sang-Young; Ham, Hyung Chul; Sung, Yung-Eun; Kim, Soo-Kil; et al, ELECTROCHEMISTRY COMMUNICATIONS, v.27, pp.46 - 49, 2013-02 |
Effects of Ru on elemental partitioning and precipitation of topologically close-packed phases in Ni-based superalloys Peng, Zirong; Povstugar, Ivan; Matuszewski, Kamil; Rettig, Ralf; Singer, Robert; Kostka, Aleksander; Choi, Pyuck-Pa; et al, SCRIPTA MATERIALIA, v.101, pp.44 - 47, 2015-05 |
Improvement of the morphological stability by stacking RuO2 on ru thin films with atomic layer deposition Kwon, Se-Hun; Kwon, Oh-Kyum; Kim, Jae-Hoon; Jeong, Seong-Jun; Kim, Sung-Wook; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.154, no.9, pp.H773 - H777, 2007 |
Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals Kwon, SH; Kwon, OK; Min, JS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.6, pp.G578 - G581, 2006 |
Promotion of topologically close-packed phases in a Ru-containing Ni-based superalloy Lee, Sangwon; Do, Jeonghyeon; Jang, Kyuseon; Jun, Hosun; Park, Yejun; Choi, Pyuck-Pa, SCRIPTA MATERIALIA, v.222, 2023-01 |
Thermal stability of RuO2 thin films prepared by modified atomic layer deposition Kim, Jin-Hyock; Ahn, Ji-Hoon; Kang, Sang-Won; Roh, Jae-Sung; Kwon, Se-Hun; Kim, Ja-Yong, CURRENT APPLIED PHYSICS, v.12, pp.S160 - S163, 2012-09 |
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