DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jung, HG | ko |
dc.contributor.author | Wee, Dang-Moon | ko |
dc.contributor.author | Oh, MH | ko |
dc.contributor.author | Kim, KY | ko |
dc.date.accessioned | 2007-10-29T13:28:38Z | - |
dc.date.available | 2007-10-29T13:28:38Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-04 | - |
dc.identifier.citation | OXIDATION OF METALS, v.55, no.3-4, pp.189 - 208 | - |
dc.identifier.issn | 0030-770X | - |
dc.identifier.uri | http://hdl.handle.net/10203/1785 | - |
dc.description.abstract | An Al + Y codeposition by a single EB-PVD process has been developed to improve the high-temperature oxidation resistance of a TiAl alloy. The Al + Y codeposited TiAl alloy with various ratios of Al and Y evaporation sources was evaluated by isothermal and cyclic-oxidation tests. The coating layer has a composition gradient because of the difference in vapor pressure between Y and Al. The oxidation resistance can be extensively improved by the formation of an Al + Y codeposition layer and it depends on the ratio of the source material of Al and Y. The best oxidation resistance was obtained from the Al + Y codeposited TiAl alloy with a ratio of Al:2Y. With the proper ratio of Al. Y, the Al + Y codeposition coating forms Two layers of the oxides during high-temperature oxidation + the outer (Y, Al) O layer and the inner Al2O3 layer, containing small amounts of Y oxide. These oxide layers, which have a fine grain size, act as a diffusion barrier, thus suppressing the rate of inward diffusion of O and may readily relieve thermal stresses. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | KLUWER ACADEMIC/PLENUM PUBL | - |
dc.subject | BEHAVIOR | - |
dc.subject | DIFFUSION | - |
dc.subject | ADDITIONS | - |
dc.subject | PACK | - |
dc.title | An Al plus Y coating process for improvement of the high-temperature oxidation resistance of a TiAl alloy | - |
dc.type | Article | - |
dc.identifier.wosid | 000168357900002 | - |
dc.identifier.scopusid | 2-s2.0-0011481599 | - |
dc.type.rims | ART | - |
dc.citation.volume | 55 | - |
dc.citation.issue | 3-4 | - |
dc.citation.beginningpage | 189 | - |
dc.citation.endingpage | 208 | - |
dc.citation.publicationname | OXIDATION OF METALS | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Wee, Dang-Moon | - |
dc.contributor.nonIdAuthor | Jung, HG | - |
dc.contributor.nonIdAuthor | Oh, MH | - |
dc.contributor.nonIdAuthor | Kim, KY | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | TiAl alloy | - |
dc.subject.keywordAuthor | Al plus Y codeposition | - |
dc.subject.keywordAuthor | oxidation resistance | - |
dc.subject.keywordAuthor | (Y, Al)O mixed oxide | - |
dc.subject.keywordAuthor | diffusion barrier | - |
dc.subject.keywordPlus | BEHAVIOR | - |
dc.subject.keywordPlus | DIFFUSION | - |
dc.subject.keywordPlus | ADDITIONS | - |
dc.subject.keywordPlus | PACK | - |
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