Cost-effective TSV Redundancy Configuration

Cited 3 time in webofscience Cited 0 time in scopus
  • Hit : 329
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorJung, Jongpilko
dc.contributor.authorKyung, Chong-Minko
dc.contributor.authorYoon, Youngjunko
dc.contributor.authorLee, Jae-Jinko
dc.contributor.authorKang, Kyungsuko
dc.date.accessioned2013-03-29T18:46:05Z-
dc.date.available2013-03-29T18:46:05Z-
dc.date.created2012-12-03-
dc.date.created2012-12-03-
dc.date.created2012-12-03-
dc.date.created2012-12-03-
dc.date.issued2012-10-08-
dc.identifier.citationIFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC), pp.263 - 266-
dc.identifier.issn2324-8432-
dc.identifier.urihttp://hdl.handle.net/10203/172933-
dc.description.abstractDespite of distinct benefits, such as small form factor, low power consumption, and high performance, the high fabrication cost from both low yield and large area of through-silicon-via (TSV) still keeps three-dimensional integrated circuit (3D IC) from being commercialized in the industry. Inserting additional TSVs (i.e., TSV redundancy) is a well-known solution to increase fabrication yield of 3D IC. However, considering the significant overhead of TSV redundancy, a design-time optimization process is required to find cost-minimal TSV redundancy configuration. In this paper, we proposed a fabrication cost model for 3D IC which takes the TSV redundancy configuration into account. The analytical cost model has been explored with various number of TSVs, to find cost-minimal TSV redundancy configuration. We have also investigated fabrication cost of 3D IC with respect to the failure rate of TSV itself, which show a trend of fabrication cost for future TSV technology.-
dc.languageEnglish-
dc.publisherIEEE Computer Society-
dc.titleCost-effective TSV Redundancy Configuration-
dc.typeConference-
dc.identifier.wosid000393378700047-
dc.identifier.scopusid2-s2.0-84958982350-
dc.type.rimsCONF-
dc.citation.beginningpage263-
dc.citation.endingpage266-
dc.citation.publicationnameIFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC)-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationSanta Cruz-
dc.identifier.doi10.1109/VLSI-SoC.2012.7332113-
dc.contributor.localauthorKyung, Chong-Min-
dc.contributor.nonIdAuthorYoon, Youngjun-
dc.contributor.nonIdAuthorLee, Jae-Jin-
dc.contributor.nonIdAuthorKang, Kyungsu-
Appears in Collection
EE-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 3 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0