Fabrication of a sub-wavelength pattern by surface plasmon lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choi, Kyung Cheol | - |
| dc.contributor.author | Kim, ES | - |
| dc.date.accessioned | 2013-03-29T17:32:00Z | - |
| dc.date.available | 2013-03-29T17:32:00Z | - |
| dc.date.created | 2012-11-29 | - |
| dc.date.issued | 2012-07-05 | - |
| dc.identifier.citation | The 4th International Conference on Microelectronics and Plasma Technology (ICMAP 2012), v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/172506 | - |
| dc.language | ENG | - |
| dc.title | Fabrication of a sub-wavelength pattern by surface plasmon lithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 4th International Conference on Microelectronics and Plasma Technology (ICMAP 2012) | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | Choi, Kyung Cheol | - |
| dc.contributor.nonIdAuthor | Kim, ES | - |
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