Fabrication of multi-segment line pattern by photo- and soft lithography

Abstract

One-dimensional nanostructures, such as an array of nanowires, exhibit distinct electronic, optical, chemical and thermal properties due to their large surface area and possible quantum confinement effects. The multiple functionalization of hetoerojunction nanowires which consist of alternatively arranged metal segments are very attractive approach to find out novel functionality and phenomena, offering promise for a range of application, including nanoscale electronics and sensor technology. In this research, we report novel method to fabricate multiple segments line pattern through soft-lthography combined with conventional photolithography technique. Firstly, we generate pre-line patterned substrate which has alternative line array two different materials in micro-scale by using photolithograph, Ion-milling and lift-off process. Then, we create polymer line pattern in nano-scale using CFL in perpendicular direction upon the substrate which is made by photolithography, after etch uncovered part of metal substrate, we can finally obtain multi-segmented line-pattern array. Our approach offers very effective way to produce highly arranged linepattern with high throughput and facile manner. We expected this kind of linepattern can be functionalized differently in each segment so that we can use it as a sensor, transistor or waveguide of electronic, biological or optical devices.