Dually Patterned Self-assembled Monolayer via Si-containing Block Copolymer Lithography on Gold Substrate

Abstract

A novel method for protein arrays is to use self-assembled monolayer (SAM) patterned by microcontact printing (CP) or nanoimprint technique. However, it is difficult to achieve high resolution replication accuracy. In this study, we use Si-containing block copolymer lithography for fabricating highly ordered nanoporous SiO2 structures on gold substrates. The silane end functionalized materials are self-assembled on SiO2 surface, while thiol with different functional groups on gold surface. This dually patterned SAM method not only offers the reward of smaller biochips, but also potentially higher sensitivity for molecular diagnostics. The details will be discussed.