Wafer admission control for clustered photolithography tools
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park, Kyungsu | ko |
| dc.contributor.author | Morrison, James R | ko |
| dc.date.accessioned | 2013-03-29T07:59:47Z | - |
| dc.date.available | 2013-03-29T07:59:47Z | - |
| dc.date.created | 2012-06-20 | - |
| dc.date.created | 2012-06-20 | - |
| dc.date.issued | 2010-07 | - |
| dc.identifier.citation | Advanced Semiconductor Manufacturing Conference , pp.220 - 225 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/169228 | - |
| dc.language | English | - |
| dc.publisher | ASMC | - |
| dc.title | Wafer admission control for clustered photolithography tools | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000287041300045 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 220 | - |
| dc.citation.endingpage | 225 | - |
| dc.citation.publicationname | Advanced Semiconductor Manufacturing Conference | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | San Francisco, CA | - |
| dc.contributor.localauthor | Morrison, James R | - |
| dc.contributor.nonIdAuthor | Park, Kyungsu | - |
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