DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choi, Yang-Kyu | - |
dc.contributor.author | Jang, Moongyu | - |
dc.contributor.author | Jun, Myungsim | - |
dc.contributor.author | Choi, Seongjin | - |
dc.date.accessioned | 2013-03-28T14:22:14Z | - |
dc.date.available | 2013-03-28T14:22:14Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2010-02-03 | - |
dc.identifier.citation | Semicon Korea 2010, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/166454 | - |
dc.language | ENG | - |
dc.publisher | Semicon Korea 2010 | - |
dc.title | Metal source/drain technology for nanoscale MOSFET & high speed flash applications | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | Semicon Korea 2010 | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Choi, Yang-Kyu | - |
dc.contributor.nonIdAuthor | Jang, Moongyu | - |
dc.contributor.nonIdAuthor | Jun, Myungsim | - |
dc.contributor.nonIdAuthor | Choi, Seongjin | - |
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