Nitrogen plasma treatment of TCO/p-a-SiC interface for efficient hole collection in thin film silicon solar cell

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dc.contributor.authorLim, Koeng Su-
dc.date.accessioned2013-03-28T13:51:39Z-
dc.date.available2013-03-28T13:51:39Z-
dc.date.created2012-02-06-
dc.date.issued2010-
dc.identifier.citation25th European photovoltaic conference and exhibition and 5th World conference on photovoltaic energy conversion, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/166276-
dc.languageENG-
dc.publisher25th European photovoltaic conference and exhibition and 5th World conference on photovoltaic energy conversion-
dc.titleNitrogen plasma treatment of TCO/p-a-SiC interface for efficient hole collection in thin film silicon solar cell-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname25th European photovoltaic conference and exhibition and 5th World conference on photovoltaic energy conversion-
dc.identifier.conferencecountrySpain-
dc.identifier.conferencecountrySpain-
dc.contributor.localauthorLim, Koeng Su-
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EE-Conference Papers(학술회의논문)
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