Properties of reactively sputtered nickel oxide films as a microbolometer sensing material
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, D.S. | ko |
| dc.contributor.author | Kwon, I.W. | ko |
| dc.contributor.author | Hwang, C.H. | ko |
| dc.contributor.author | Lee, Hee Chul | ko |
| dc.contributor.author | Lee, Y.S. | ko |
| dc.date.accessioned | 2013-03-28T11:28:13Z | - |
| dc.date.available | 2013-03-28T11:28:13Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2010-04-05 | - |
| dc.identifier.citation | Infrared Technology and Applications XXXVI | - |
| dc.identifier.uri | http://hdl.handle.net/10203/165311 | - |
| dc.language | English | - |
| dc.publisher | Infrared Technology and Applications XXXVI | - |
| dc.title | Properties of reactively sputtered nickel oxide films as a microbolometer sensing material | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000285545300043 | - |
| dc.identifier.scopusid | 2-s2.0-79953716288 | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Infrared Technology and Applications XXXVI | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | Orlando, FL | - |
| dc.contributor.localauthor | Lee, Hee Chul | - |
| dc.contributor.nonIdAuthor | Kim, D.S. | - |
| dc.contributor.nonIdAuthor | Kwon, I.W. | - |
| dc.contributor.nonIdAuthor | Hwang, C.H. | - |
| dc.contributor.nonIdAuthor | Lee, Y.S. | - |
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