A through-silicon-via to active device noise coupling study for CMOS SOI technology

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dc.contributor.authorDuan, X.ko
dc.contributor.authorGu, X.ko
dc.contributor.authorCho, J.ko
dc.contributor.authorKim, Jounghoko
dc.date.accessioned2013-03-28T10:43:02Z-
dc.date.available2013-03-28T10:43:02Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2011-05-31-
dc.identifier.citation2011 61st Electronic Components and Technology Conference, ECTC 2011, pp.1791 - 1795-
dc.identifier.issn0569-5503-
dc.identifier.urihttp://hdl.handle.net/10203/164971-
dc.languageEnglish-
dc.publisherECTC 2011-
dc.titleA through-silicon-via to active device noise coupling study for CMOS SOI technology-
dc.typeConference-
dc.identifier.wosid000302341400274-
dc.identifier.scopusid2-s2.0-79960425453-
dc.type.rimsCONF-
dc.citation.beginningpage1791-
dc.citation.endingpage1795-
dc.citation.publicationname2011 61st Electronic Components and Technology Conference, ECTC 2011-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationLake Buena Vista, FL-
dc.contributor.localauthorKim, Joungho-
dc.contributor.nonIdAuthorDuan, X.-
dc.contributor.nonIdAuthorGu, X.-
dc.contributor.nonIdAuthorCho, J.-
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EE-Conference Papers(학술회의논문)
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