Effect of O-vacancy on the device instability of amorphous zinc-tin-oxide thin-film-transistors

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dc.contributor.authorRyu, B.-
dc.contributor.authorChang, Kee-Joo-
dc.date.accessioned2013-03-28T09:31:51Z-
dc.date.available2013-03-28T09:31:51Z-
dc.date.created2012-02-06-
dc.date.issued2010-10-11-
dc.identifier.citation10th International Meeting on Information Display and International Display Manufacturing Conference and Asia Display 2010, IMID/IDMC/ASIA Display 2010, v., no., pp.664 - 665-
dc.identifier.issn1738-7558-
dc.identifier.urihttp://hdl.handle.net/10203/164542-
dc.languageENG-
dc.titleEffect of O-vacancy on the device instability of amorphous zinc-tin-oxide thin-film-transistors-
dc.typeConference-
dc.identifier.scopusid2-s2.0-79959967651-
dc.type.rimsCONF-
dc.citation.beginningpage664-
dc.citation.endingpage665-
dc.citation.publicationname10th International Meeting on Information Display and International Display Manufacturing Conference and Asia Display 2010, IMID/IDMC/ASIA Display 2010-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorChang, Kee-Joo-
dc.contributor.nonIdAuthorRyu, B.-
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PH-Conference Papers(학술회의논문)
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