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Ultimately scaled 20nm unified-RAM

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dc.contributor.authorMoon, D.-I.ko
dc.contributor.authorChoi, S.-J.ko
dc.contributor.authorKim, C.-J.ko
dc.contributor.authorKim, J.-Y.ko
dc.contributor.authorLee, J.-S.ko
dc.contributor.authorOh, J.-S.ko
dc.contributor.authorLee, G.-S.ko
dc.contributor.authorPark, Y.-C.ko
dc.contributor.authorHong, D.-W.ko
dc.contributor.authorLee, D.-W.ko
dc.contributor.authorKim, Y.-S.ko
dc.contributor.authorKim, J.-W.ko
dc.contributor.authorHan, J.-W.ko
dc.contributor.authorChoi, Yang-Kyuko
dc.date.accessioned2013-03-28T07:45:15Z-
dc.date.available2013-03-28T07:45:15Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2010-12-06-
dc.identifier.citation2010 IEEE International Electron Devices Meeting-
dc.identifier.issn0163-1918-
dc.identifier.urihttp://hdl.handle.net/10203/163927-
dc.languageEnglish-
dc.publisherIEEE-
dc.titleUltimately scaled 20nm unified-RAM-
dc.typeConference-
dc.identifier.wosid000287997300070-
dc.identifier.scopusid2-s2.0-79951828284-
dc.type.rimsCONF-
dc.citation.publicationname2010 IEEE International Electron Devices Meeting-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationSan Francisco, CA-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.contributor.nonIdAuthorMoon, D.-I.-
dc.contributor.nonIdAuthorChoi, S.-J.-
dc.contributor.nonIdAuthorKim, C.-J.-
dc.contributor.nonIdAuthorKim, J.-Y.-
dc.contributor.nonIdAuthorLee, J.-S.-
dc.contributor.nonIdAuthorOh, J.-S.-
dc.contributor.nonIdAuthorLee, G.-S.-
dc.contributor.nonIdAuthorPark, Y.-C.-
dc.contributor.nonIdAuthorHong, D.-W.-
dc.contributor.nonIdAuthorLee, D.-W.-
dc.contributor.nonIdAuthorKim, Y.-S.-
dc.contributor.nonIdAuthorKim, J.-W.-
dc.contributor.nonIdAuthorHan, J.-W.-
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EE-Conference Papers(학술회의논문)
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