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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Two step annealing of iridium thin films prepared by plasma-enhanced atomic layer deposition

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Kim S.-W. / Kwon S.-H. / Kang S.-W.researcher
Issue Date
2008-10-13
Language
ENG
Citation

Atomic Layer Deposition Applications 4 - 214th ECS Meeting, pp.309 - 314

ISSN
1938-5862
URI
http://hdl.handle.net/10203/156404
Appears in Collection
MS-Conference Papers(학술회의논문)
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