Damage free etching of RuO2 in O2/He plasmaDamage free etching of RuO2 in O2/He plasma
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Cho, Byung Jin | - |
| dc.contributor.author | Hwang, WS | - |
| dc.contributor.author | Bliznetsov, VN | - |
| dc.contributor.author | Chan, DSH | - |
| dc.contributor.author | Yoo, WJ | - |
| dc.date.accessioned | 2013-03-18T22:54:06Z | - |
| dc.date.available | 2013-03-18T22:54:06Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2006-11-29 | - |
| dc.identifier.citation | 28th International Symposium on Dry Process, v., no., pp.0 - 0 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/153314 | - |
| dc.language | ENG | - |
| dc.title | Damage free etching of RuO2 in O2/He plasma | - |
| dc.title.alternative | Damage free etching of RuO2 in O2/He plasma | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 0 | - |
| dc.citation.endingpage | 0 | - |
| dc.citation.publicationname | 28th International Symposium on Dry Process | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.contributor.localauthor | Cho, Byung Jin | - |
| dc.contributor.nonIdAuthor | Hwang, WS | - |
| dc.contributor.nonIdAuthor | Bliznetsov, VN | - |
| dc.contributor.nonIdAuthor | Chan, DSH | - |
| dc.contributor.nonIdAuthor | Yoo, WJ | - |
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