Negative nanomolecular resists based on calix[4]resocinarene
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Oh, Tae-Hwan | ko |
| dc.contributor.author | Ganesan, Ramakrishnan | ko |
| dc.contributor.author | Yoon, Je-Moon | ko |
| dc.contributor.author | Kim, Jin-Baek | ko |
| dc.date.accessioned | 2013-03-18T18:01:17Z | - |
| dc.date.available | 2013-03-18T18:01:17Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2006-02-20 | - |
| dc.identifier.citation | Advances in Resist Technology and Processing XXIII | - |
| dc.identifier.issn | 0277-786X | - |
| dc.identifier.uri | http://hdl.handle.net/10203/150987 | - |
| dc.language | English | - |
| dc.publisher | SPIE | - |
| dc.title | Negative nanomolecular resists based on calix[4]resocinarene | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000238175500084 | - |
| dc.identifier.scopusid | 2-s2.0-33745597384 | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Advances in Resist Technology and Processing XXIII | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | San JOse, CA | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Oh, Tae-Hwan | - |
| dc.contributor.nonIdAuthor | Ganesan, Ramakrishnan | - |
| dc.contributor.nonIdAuthor | Yoon, Je-Moon | - |
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