Electronic state and O K-edge of Zr oxide and Hf oxide thin films for phase shift mask

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Publisher
The 17th DV-Xα meeting
Issue Date
2004-08-05
Language
ENG
Citation

The 17th DV-Xα meeting, v.0, no.0, pp.0 - 0

URI
http://hdl.handle.net/10203/150852
Appears in Collection
MS-Conference Papers(학술회의논문)
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