Nanomolecular resists with adamantane core for 193-nm lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jin-Baek | ko |
| dc.contributor.author | Oh, Tae-Hwan | ko |
| dc.contributor.author | Kim, Jin-Baek | ko |
| dc.date.accessioned | 2013-03-18T17:43:22Z | - |
| dc.date.available | 2013-03-18T17:43:22Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2005-02-28 | - |
| dc.identifier.citation | Advances in Resist Technology and Processing XXII, pp.603 - 610 | - |
| dc.identifier.issn | 1605-7422 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/150845 | - |
| dc.language | English | - |
| dc.publisher | SPIE | - |
| dc.title | Nanomolecular resists with adamantane core for 193-nm lithography | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000229580700063 | - |
| dc.identifier.scopusid | 2-s2.0-24644436106 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 603 | - |
| dc.citation.endingpage | 610 | - |
| dc.citation.publicationname | Advances in Resist Technology and Processing XXII | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | San Jose, CA | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Oh, Tae-Hwan | - |
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