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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Optical properties of a-Si films for 157 nm lithography

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dc.contributor.authorKim, S-
dc.contributor.authorKim, Y-
dc.contributor.authorKang, M-
dc.contributor.authorSohn, J-
dc.contributor.authorNo, Kwangsoo-
dc.date.accessioned2013-03-18T16:06:57Z-
dc.date.available2013-03-18T16:06:57Z-
dc.date.created2012-02-06-
dc.date.issued2003-04-16-
dc.identifier.citationPhotomask and Next-Generation Lithography Mask Technology X, v.5130, no., pp.127 - 135-
dc.identifier.urihttp://hdl.handle.net/10203/150034-
dc.languageENG-
dc.titleOptical properties of a-Si films for 157 nm lithography-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0942301035-
dc.type.rimsCONF-
dc.citation.volume5130-
dc.citation.beginningpage127-
dc.citation.endingpage135-
dc.citation.publicationnamePhotomask and Next-Generation Lithography Mask Technology X-
dc.identifier.conferencecountryJapan-
dc.identifier.conferencecountryJapan-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorKim, S-
dc.contributor.nonIdAuthorKim, Y-
dc.contributor.nonIdAuthorKang, M-
dc.contributor.nonIdAuthorSohn, J-
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MS-Conference Papers(학술회의논문)
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