DC Field | Value | Language |
---|---|---|
dc.contributor.author | No, Kwangsoo | - |
dc.contributor.author | Choi, Jong Wan | - |
dc.contributor.author | Hong, Jong In | - |
dc.contributor.author | Heo, Jung Shik | - |
dc.contributor.author | Moon, Sang Heup | - |
dc.date.accessioned | 2013-03-18T16:02:49Z | - |
dc.date.available | 2013-03-18T16:02:49Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-04-28 | - |
dc.identifier.citation | 203rd Meeting of The Electrochemical Society, v.0, no.0, pp.0 - 0 | - |
dc.identifier.uri | http://hdl.handle.net/10203/150008 | - |
dc.language | ENG | - |
dc.publisher | ECS | - |
dc.title | Thermal decomposition of Ru(EtCp)2 and metallorganic chemical vapor deposition of Ruthenium thin films using Ru(EtCp)2 | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.volume | 0 | - |
dc.citation.issue | 0 | - |
dc.citation.beginningpage | 0 | - |
dc.citation.endingpage | 0 | - |
dc.citation.publicationname | 203rd Meeting of The Electrochemical Society | - |
dc.identifier.conferencecountry | France | - |
dc.identifier.conferencecountry | France | - |
dc.contributor.localauthor | No, Kwangsoo | - |
dc.contributor.nonIdAuthor | Choi, Jong Wan | - |
dc.contributor.nonIdAuthor | Hong, Jong In | - |
dc.contributor.nonIdAuthor | Heo, Jung Shik | - |
dc.contributor.nonIdAuthor | Moon, Sang Heup | - |
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