Structural and Electrical Characteristics of HfO2/Al2O3 Nanolaminate Films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Sang-Won Kang | - |
| dc.date.accessioned | 2013-03-18T14:48:53Z | - |
| dc.date.available | 2013-03-18T14:48:53Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2006 | - |
| dc.identifier.citation | AVS 6th International Conference on Atomic Layer Deposition, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/149421 | - |
| dc.language | ENG | - |
| dc.title | Structural and Electrical Characteristics of HfO2/Al2O3 Nanolaminate Films | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | AVS 6th International Conference on Atomic Layer Deposition | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | Sang-Won Kang | - |
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