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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

High-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applicationsHigh-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applications

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dc.contributor.authorCho, Byung Jin-
dc.contributor.authorHu, H-
dc.contributor.authorDing, SJ-
dc.contributor.authorLim, HF-
dc.contributor.authorZhu, C-
dc.contributor.authorLi, MF-
dc.contributor.authorKim, SJ-
dc.date.accessioned2013-03-18T08:48:46Z-
dc.date.available2013-03-18T08:48:46Z-
dc.date.created2012-02-06-
dc.date.issued2003-12-08-
dc.identifier.citationInternational Electron Device Meeting (IEDM), v., no., pp.0 - 0-
dc.identifier.urihttp://hdl.handle.net/10203/146666-
dc.languageENG-
dc.titleHigh-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applications-
dc.title.alternativeHigh-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applications-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage0-
dc.citation.endingpage0-
dc.citation.publicationnameInternational Electron Device Meeting (IEDM)-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorHu, H-
dc.contributor.nonIdAuthorDing, SJ-
dc.contributor.nonIdAuthorLim, HF-
dc.contributor.nonIdAuthorZhu, C-
dc.contributor.nonIdAuthorLi, MF-
dc.contributor.nonIdAuthorKim, SJ-
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EE-Conference Papers(학술회의논문)
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