New Substrate Platform for Metal-Gate/High-k Gate Dielectric MOSFET Integration and RF Technology up to 100 GHzNew Substrate Platform for Metal-Gate/High-k Gate Dielectric MOSFET Integration and RF Technology up to 100 GHz

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dc.contributor.authorCho, Byung Jin-
dc.contributor.authorChin, A-
dc.contributor.authorMei, P-
dc.contributor.authorZhu, C-
dc.contributor.authorLi, MF-
dc.contributor.authorLee, S-
dc.contributor.authorYoo, WJ-
dc.date.accessioned2013-03-18T08:12:00Z-
dc.date.available2013-03-18T08:12:00Z-
dc.date.created2012-02-06-
dc.date.issued2003-11-13-
dc.identifier.citationAdvanced Crystal Growth Conference and 2003 International Symposium on Substrate Engineering, v., no., pp.0 - 0-
dc.identifier.urihttp://hdl.handle.net/10203/146367-
dc.languageENG-
dc.titleNew Substrate Platform for Metal-Gate/High-k Gate Dielectric MOSFET Integration and RF Technology up to 100 GHz-
dc.title.alternativeNew Substrate Platform for Metal-Gate/High-k Gate Dielectric MOSFET Integration and RF Technology up to 100 GHz-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage0-
dc.citation.endingpage0-
dc.citation.publicationnameAdvanced Crystal Growth Conference and 2003 International Symposium on Substrate Engineering-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorChin, A-
dc.contributor.nonIdAuthorMei, P-
dc.contributor.nonIdAuthorZhu, C-
dc.contributor.nonIdAuthorLi, MF-
dc.contributor.nonIdAuthorLee, S-
dc.contributor.nonIdAuthorYoo, WJ-
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EE-Conference Papers(학술회의논문)
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