Defect formation mechanisms in the interfacial layer due to thermal treatment between the ZnO thin film and the Si substrate
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Yuk, Jong Min | - |
| dc.contributor.author | Lee, Jeong Yong | - |
| dc.date.accessioned | 2013-03-18T06:33:46Z | - |
| dc.date.available | 2013-03-18T06:33:46Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2006-12-19 | - |
| dc.identifier.citation | Asian-Pacific Conference on Surface Science | - |
| dc.identifier.uri | http://hdl.handle.net/10203/145640 | - |
| dc.language | English | - |
| dc.publisher | Asian-Pacific Conference | - |
| dc.title | Defect formation mechanisms in the interfacial layer due to thermal treatment between the ZnO thin film and the Si substrate | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Asian-Pacific Conference on Surface Science | - |
| dc.identifier.conferencecountry | HK | - |
| dc.identifier.conferencelocation | Hong Kong | - |
| dc.contributor.localauthor | Yuk, Jong Min | - |
| dc.contributor.localauthor | Lee, Jeong Yong | - |
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