Growth of epitaxially thin CoSi2 layer using Co-N film as a cobalt source
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ahn, Byung Tae | - |
| dc.date.accessioned | 2013-03-18T05:19:19Z | - |
| dc.date.available | 2013-03-18T05:19:19Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2004-04-01 | - |
| dc.identifier.citation | Material research society, v., no., pp.0 - 0 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/145095 | - |
| dc.language | ENG | - |
| dc.title | Growth of epitaxially thin CoSi2 layer using Co-N film as a cobalt source | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 0 | - |
| dc.citation.endingpage | 0 | - |
| dc.citation.publicationname | Material research society | - |
| dc.contributor.localauthor | Ahn, Byung Tae | - |
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