DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kwon, G.-C. | - |
dc.contributor.author | Kim, H.-S. | - |
dc.contributor.author | Kim, J.-S. | - |
dc.contributor.author | Choi, S.-H. | - |
dc.contributor.author | Jun, J.-H. | - |
dc.contributor.author | Lee, D.S. | - |
dc.contributor.author | Lee, Y.K. | - |
dc.contributor.author | Chang, Hong-Young | - |
dc.date.accessioned | 2013-03-17T06:57:52Z | - |
dc.date.available | 2013-03-17T06:57:52Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-06-02 | - |
dc.identifier.citation | 2003 IEEE International Conference on Plasma Science, v., no., pp.403 - | - |
dc.identifier.issn | 0730-9244 | - |
dc.identifier.uri | http://hdl.handle.net/10203/140878 | - |
dc.language | ENG | - |
dc.publisher | IEEE | - |
dc.title | New Plasma Source Development Using a Parallel Resonance Antenna for Dry Etching | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-0141893260 | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 403 | - |
dc.citation.publicationname | 2003 IEEE International Conference on Plasma Science | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Chang, Hong-Young | - |
dc.contributor.nonIdAuthor | Kwon, G.-C. | - |
dc.contributor.nonIdAuthor | Kim, H.-S. | - |
dc.contributor.nonIdAuthor | Kim, J.-S. | - |
dc.contributor.nonIdAuthor | Choi, S.-H. | - |
dc.contributor.nonIdAuthor | Jun, J.-H. | - |
dc.contributor.nonIdAuthor | Lee, D.S. | - |
dc.contributor.nonIdAuthor | Lee, Y.K. | - |
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