Nanomolecular resist with adamantane core for 193-nm lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jin-Baek | - |
| dc.date.accessioned | 2013-03-17T03:58:26Z | - |
| dc.date.available | 2013-03-17T03:58:26Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2005-02 | - |
| dc.identifier.citation | 2005 CHemistry Symposium of Kaist-KYOTO University, v., no., pp.0 - 0 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/139602 | - |
| dc.language | ENG | - |
| dc.title | Nanomolecular resist with adamantane core for 193-nm lithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 0 | - |
| dc.citation.endingpage | 0 | - |
| dc.citation.publicationname | 2005 CHemistry Symposium of Kaist-KYOTO University | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
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