Integration of microwave tunable (Ba,Sr)TiO3 based thin films with high-resistivity silicon substrates
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Ho Gi | - |
| dc.date.accessioned | 2013-03-17T03:09:55Z | - |
| dc.date.available | 2013-03-17T03:09:55Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2005-06-05 | - |
| dc.identifier.citation | 2005 International Symposium on Electrical Insulating Materials, ISEIM 2005, v.1, no., pp.193 - 194 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/139241 | - |
| dc.language | ENG | - |
| dc.title | Integration of microwave tunable (Ba,Sr)TiO3 based thin films with high-resistivity silicon substrates | - |
| dc.type | Conference | - |
| dc.identifier.scopusid | 2-s2.0-25644432128 | - |
| dc.type.rims | CONF | - |
| dc.citation.volume | 1 | - |
| dc.citation.beginningpage | 193 | - |
| dc.citation.endingpage | 194 | - |
| dc.citation.publicationname | 2005 International Symposium on Electrical Insulating Materials, ISEIM 2005 | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.contributor.localauthor | Kim, Ho Gi | - |
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