DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ganesan, Ramakrishnan | - |
dc.contributor.author | Kim, Jin-Baek | - |
dc.date.accessioned | 2013-03-17T03:05:40Z | - |
dc.date.available | 2013-03-17T03:05:40Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2005-09-30 | - |
dc.identifier.citation | Korea-Japan Young Scientist Symposium on polymers, 2005, v., no., pp.0 - 0 | - |
dc.identifier.uri | http://hdl.handle.net/10203/139213 | - |
dc.language | ENG | - |
dc.publisher | JSPS, KOSEF | - |
dc.title | Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for Deep-UV Lithography | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 0 | - |
dc.citation.endingpage | 0 | - |
dc.citation.publicationname | Korea-Japan Young Scientist Symposium on polymers, 2005 | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Ganesan, Ramakrishnan | - |
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