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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Water-developable resists based on glyceryl methacrylate for 193-nm lithography

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dc.contributor.authorKim, Jin-Baek-
dc.contributor.authorJang, Ji-Hyun-
dc.contributor.authorChoi, Jae-Hak-
dc.contributor.authorLee, Kwan-Ku-
dc.contributor.authorKo, Jong-Sung-
dc.date.accessioned2013-03-17T02:18:45Z-
dc.date.available2013-03-17T02:18:45Z-
dc.date.created2012-02-06-
dc.date.issued2004-02-23-
dc.identifier.citationAdvances in Resist Technology and Processing XXI, v.5376, no., pp.616 - 624-
dc.identifier.urihttp://hdl.handle.net/10203/138809-
dc.languageENG-
dc.titleWater-developable resists based on glyceryl methacrylate for 193-nm lithography-
dc.typeConference-
dc.identifier.scopusid2-s2.0-3843091538-
dc.type.rimsCONF-
dc.citation.volume5376-
dc.citation.beginningpage616-
dc.citation.endingpage624-
dc.citation.publicationnameAdvances in Resist Technology and Processing XXI-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorJang, Ji-Hyun-
dc.contributor.nonIdAuthorChoi, Jae-Hak-
dc.contributor.nonIdAuthorLee, Kwan-Ku-
dc.contributor.nonIdAuthorKo, Jong-Sung-
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CH-Conference Papers(학술회의논문)
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