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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography

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dc.contributor.authorGanesan, Ramakrishnanko
dc.contributor.authorChoi, Jae-Hakko
dc.contributor.authorKim, Kyoung-Seonko
dc.contributor.authorOh, Tae-Hwanko
dc.contributor.authorYun, Hyo-Jinko
dc.contributor.authorKwon, Young-Gilko
dc.contributor.authorKim, Jin-Baekko
dc.date.accessioned2013-03-17T01:46:24Z-
dc.date.available2013-03-17T01:46:24Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2005-02-27-
dc.identifier.citationSPIE-The International Society for Optical Engineering, pp.0-
dc.identifier.urihttp://hdl.handle.net/10203/138509-
dc.languageEnglish-
dc.publisherSPIE-
dc.titleBilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography-
dc.typeConference-
dc.identifier.wosid000229580700071-
dc.type.rimsCONF-
dc.citation.beginningpage0-
dc.citation.endingpage0-
dc.citation.publicationnameSPIE-The International Society for Optical Engineering-
dc.identifier.conferencecountryKO-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorGanesan, Ramakrishnan-
dc.contributor.nonIdAuthorChoi, Jae-Hak-
dc.contributor.nonIdAuthorKim, Kyoung-Seon-
dc.contributor.nonIdAuthorOh, Tae-Hwan-
dc.contributor.nonIdAuthorYun, Hyo-Jin-
dc.contributor.nonIdAuthorKwon, Young-Gil-
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CH-Conference Papers(학술회의논문)
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