Effect of Gas Composition on UV-excited O2 GPC for the Removal of Organic Contaminants on a Silicon Wafer
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kwon, S. K. | - |
| dc.contributor.author | Kim, DoHyun | - |
| dc.date.accessioned | 2013-03-16T21:44:59Z | - |
| dc.date.available | 2013-03-16T21:44:59Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1999-10 | - |
| dc.identifier.citation | Proc. 12th Intern. Symposium on Chemical Engineering, v., no., pp.151 - 152 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/136206 | - |
| dc.language | ENG | - |
| dc.title | Effect of Gas Composition on UV-excited O2 GPC for the Removal of Organic Contaminants on a Silicon Wafer | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 151 | - |
| dc.citation.endingpage | 152 | - |
| dc.citation.publicationname | Proc. 12th Intern. Symposium on Chemical Engineering | - |
| dc.contributor.localauthor | Kim, DoHyun | - |
| dc.contributor.nonIdAuthor | Kwon, S. K. | - |
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