Fabrication of MgB2 thin film by rf magnetron sputtering
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ahn J.-R. | - |
| dc.contributor.author | Lee S.-G. | - |
| dc.contributor.author | Hwang Y. | - |
| dc.contributor.author | Sung G.Y. | - |
| dc.contributor.author | Kim, Do Kyung | - |
| dc.date.accessioned | 2013-03-16T20:44:11Z | - |
| dc.date.available | 2013-03-16T20:44:11Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2002-08-20 | - |
| dc.identifier.citation | proceedings of the 23rd international conference on low temper, v., no., pp.127 - 128 | - |
| dc.identifier.issn | 0921-4534 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/135639 | - |
| dc.language | ENG | - |
| dc.title | Fabrication of MgB2 thin film by rf magnetron sputtering | - |
| dc.type | Conference | - |
| dc.identifier.scopusid | 2-s2.0-0038527303 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 127 | - |
| dc.citation.endingpage | 128 | - |
| dc.citation.publicationname | proceedings of the 23rd international conference on low temper | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.contributor.localauthor | Kim, Do Kyung | - |
| dc.contributor.nonIdAuthor | Ahn J.-R. | - |
| dc.contributor.nonIdAuthor | Lee S.-G. | - |
| dc.contributor.nonIdAuthor | Hwang Y. | - |
| dc.contributor.nonIdAuthor | Sung G.Y. | - |
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