DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yong Y.-J. | - |
dc.contributor.author | Kang Y.-S. | - |
dc.contributor.author | Lee P.S. | - |
dc.contributor.author | Lee, Jai Young | - |
dc.date.accessioned | 2013-03-16T20:43:02Z | - |
dc.date.available | 2013-03-16T20:43:02Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-04-22 | - |
dc.identifier.citation | 6th International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors, v.20, no.1, pp.42 - 46 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | http://hdl.handle.net/10203/135630 | - |
dc.language | ENG | - |
dc.title | Fabrication of c-axis oriented ZnO/AlN thin films prepared by radio frequency reactive sputtering and development of ZnO/AlN layered structure surface acoustic wave devices | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-0036124758 | - |
dc.type.rims | CONF | - |
dc.citation.volume | 20 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 42 | - |
dc.citation.endingpage | 46 | - |
dc.citation.publicationname | 6th International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Lee, Jai Young | - |
dc.contributor.nonIdAuthor | Yong Y.-J. | - |
dc.contributor.nonIdAuthor | Kang Y.-S. | - |
dc.contributor.nonIdAuthor | Lee P.S. | - |
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