D.C. Magnetron Reactive sputtering 법으로 증착한 ITO박막의 밀도가 비저항, 잔류응력에 미치는 영향
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 최시경 | - |
| dc.contributor.author | Lee, JI | - |
| dc.date.accessioned | 2013-03-16T20:41:41Z | - |
| dc.date.available | 2013-03-16T20:41:41Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1999 | - |
| dc.identifier.citation | 추계 한국요업학회, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/135611 | - |
| dc.language | KOR | - |
| dc.title | D.C. Magnetron Reactive sputtering 법으로 증착한 ITO박막의 밀도가 비저항, 잔류응력에 미치는 영향 | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 추계 한국요업학회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 최시경 | - |
| dc.contributor.nonIdAuthor | Lee, JI | - |
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