A New Wide-Dimensional Floating Microstructure Fabrication Technology Using Laterally Anodized and Oxidized Porous Silicon as a Sacrificial Layer with Double Diffusion

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 335
  • Download : 0
DC FieldValueLanguage
dc.contributor.author한철희-
dc.date.accessioned2013-03-16T19:28:12Z-
dc.date.available2013-03-16T19:28:12Z-
dc.date.created2012-02-06-
dc.date.issued1999-
dc.identifier.citation반도체 학술대회, v., no., pp.167 - 168-
dc.identifier.urihttp://hdl.handle.net/10203/134938-
dc.languageKOR-
dc.titleA New Wide-Dimensional Floating Microstructure Fabrication Technology Using Laterally Anodized and Oxidized Porous Silicon as a Sacrificial Layer with Double Diffusion-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage167-
dc.citation.endingpage168-
dc.citation.publicationname반도체 학술대회-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor한철희-
Appears in Collection
RIMS Conference Papers
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0