The Effect of Post-annealing on the Photocurrent in BaTiO3 Thin Film Deposited by RF Magnetron Sputtering
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 최시경 | - |
| dc.date.accessioned | 2013-03-16T19:05:51Z | - |
| dc.date.available | 2013-03-16T19:05:51Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2001 | - |
| dc.identifier.citation | 한국세라믹학회, v., no., pp.93 - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/134673 | - |
| dc.language | KOR | - |
| dc.title | The Effect of Post-annealing on the Photocurrent in BaTiO3 Thin Film Deposited by RF Magnetron Sputtering | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 93 | - |
| dc.citation.publicationname | 한국세라믹학회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 최시경 | - |
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