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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Adhesion-promoted copolymers for 193-nm photoresists without cross-linking during lithographic process

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dc.contributor.authorYun, Hyo-Jin-
dc.contributor.authorKwon, Young-Gil-
dc.contributor.authorLee, Bum Wook-
dc.contributor.authorKim, Jin-Baek-
dc.date.accessioned2013-03-16T13:34:13Z-
dc.date.available2013-03-16T13:34:13Z-
dc.date.created2012-02-06-
dc.date.issued2000-01-
dc.identifier.citationJournal of Photopolymer Science and Technology, v., no., pp.629 - 634-
dc.identifier.urihttp://hdl.handle.net/10203/131795-
dc.languageENG-
dc.titleAdhesion-promoted copolymers for 193-nm photoresists without cross-linking during lithographic process-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage629-
dc.citation.endingpage634-
dc.citation.publicationnameJournal of Photopolymer Science and Technology-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorYun, Hyo-Jin-
dc.contributor.nonIdAuthorKwon, Young-Gil-
dc.contributor.nonIdAuthorLee, Bum Wook-
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CH-Conference Papers(학술회의논문)
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