DC Field | Value | Language |
---|---|---|
dc.contributor.author | KANG SANG WON | - |
dc.date.accessioned | 2013-03-16T12:23:58Z | - |
dc.date.available | 2013-03-16T12:23:58Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2002-01-01 | - |
dc.identifier.citation | Atomic layer Deposition (ALD) 2002, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/131260 | - |
dc.language | ENG | - |
dc.title | Plasma-enhanced atomic layer deposition of TiN thin film using TiCl4 and N2/H2/Ar radicals | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | Atomic layer Deposition (ALD) 2002 | - |
dc.contributor.localauthor | KANG SANG WON | - |
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