Deposition and characterization of Ti-Al-N thin films deposited by plasma-assisted atomic layer deposition
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 강상원 | ko |
| dc.date.accessioned | 2013-03-16T11:56:25Z | - |
| dc.date.available | 2013-03-16T11:56:25Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2002-06 | - |
| dc.identifier.citation | 한국진공학회 제23회 학술발표회 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/131040 | - |
| dc.language | Korean | - |
| dc.publisher | 한국진공학회 | - |
| dc.title | Deposition and characterization of Ti-Al-N thin films deposited by plasma-assisted atomic layer deposition | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 한국진공학회 제23회 학술발표회 | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | 강원대학교 자연과학관 | - |
| dc.contributor.localauthor | 강상원 | - |
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.