Simple fabrication method for vertical taper using tensile stress-induced mask and selective etching technique

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dc.contributor.authorJeon Soo-kun-
dc.contributor.authorKwon, Young Se-
dc.date.accessioned2013-03-16T04:49:04Z-
dc.date.available2013-03-16T04:49:04Z-
dc.date.created2012-02-06-
dc.date.issued1999-08-30-
dc.identifier.citationProceedings of the 1999 Pacific Rim Conference on Lasers and Electro-Optcis (CLEO/PACIFIC Rim '99), v.2, no., pp.320 - 321-
dc.identifier.urihttp://hdl.handle.net/10203/127592-
dc.languageENG-
dc.titleSimple fabrication method for vertical taper using tensile stress-induced mask and selective etching technique-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0033342701-
dc.type.rimsCONF-
dc.citation.volume2-
dc.citation.beginningpage320-
dc.citation.endingpage321-
dc.citation.publicationnameProceedings of the 1999 Pacific Rim Conference on Lasers and Electro-Optcis (CLEO/PACIFIC Rim '99)-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorKwon, Young Se-
dc.contributor.nonIdAuthorJeon Soo-kun-
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EE-Conference Papers(학술회의논문)
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