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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Chemically amplified resists based on the norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group

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Kim, Jin-Baekresearcher / Lee, Jae Jun / Kang, Jae-Sung
Publisher
SPIE
Issue Date
2000-02-28
Language
English
Citation

Advances in Resist Technology and Processing XVII, pp.1079 - 1087

URI
http://hdl.handle.net/10203/127214
Appears in Collection
CH-Conference Papers(학술회의논문)
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