40 nm Electron beam patterning by optimization of digitizing method and post exposure bake and its application to silicon nano-fabrication

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 426
  • Download : 0
Issue Date
1999
Language
ENG
Citation

International workshop on Advanced LSI's and Devices, pp.72 - 76

URI
http://hdl.handle.net/10203/126738
Appears in Collection
EE-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0