DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yang, Seung-Man | ko |
dc.contributor.author | Jang, SG | ko |
dc.contributor.author | Choi, DG | ko |
dc.contributor.author | Kim, S | ko |
dc.contributor.author | Yu, HK | ko |
dc.date.accessioned | 2009-11-16T07:02:15Z | - |
dc.date.available | 2009-11-16T07:02:15Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2006-04 | - |
dc.identifier.citation | SMALL, v.2, no.4, pp.458 - 475 | - |
dc.identifier.issn | 1613-6810 | - |
dc.identifier.uri | http://hdl.handle.net/10203/12657 | - |
dc.description.abstract | Colloidal lithography is a recently emerging field; the evolution of this simple technique is still in progress. Recent advances in this area have developed a variety of practical routes of colloidal lithography, which have great potential to replace, at least partially, complex and high-cost advanced lithographic techniques. This Review presents the state of the art of colloidal lithography and consists of three main parts, beginning with synthetic routes to monodisperse colloids and their self-assembly with low defect concentrations, which. are used as lithographic masks. Then, we will introduce the modification of the colloidal masks using reactive ion. etching (RIE), which produces a variety of nanoscopic features and multifaceted particles. Finally, a few prospective applications of colloidal lithography will be discussed. | - |
dc.description.sponsorship | the Center for Nanoscale Mechatronics and Manufacturing of the 21st Century Frontier Research Program (M102 KN010002-05 K1401-00214) and the National R&D Project for Nano Science and Technology of the Ministry of Commerce, Industry and Energy | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | MONODISPERSE SILICA PARTICLES | - |
dc.subject | ENHANCED RAMAN-SCATTERING | - |
dc.subject | ALIGNED CARBON NANOTUBES | - |
dc.subject | MODEL FILLED POLYMERS | - |
dc.subject | PERIODIC NANOPILLAR ARRAYS | - |
dc.subject | EDGE-SPREADING LITHOGRAPHY | - |
dc.subject | SURFACE-PLASMON RESONANCE | - |
dc.subject | NANOSPHERE LITHOGRAPHY | - |
dc.subject | ELECTRIC-FIELD | - |
dc.subject | DISPERSION POLYMERIZATION | - |
dc.title | Nanomachining by colloidal lithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000235978700002 | - |
dc.identifier.scopusid | 2-s2.0-33644887719 | - |
dc.type.rims | ART | - |
dc.citation.volume | 2 | - |
dc.citation.issue | 4 | - |
dc.citation.beginningpage | 458 | - |
dc.citation.endingpage | 475 | - |
dc.citation.publicationname | SMALL | - |
dc.identifier.doi | 10.1002/smll.200500390 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Yang, Seung-Man | - |
dc.contributor.nonIdAuthor | Jang, SG | - |
dc.contributor.nonIdAuthor | Choi, DG | - |
dc.contributor.nonIdAuthor | Kim, S | - |
dc.contributor.nonIdAuthor | Yu, HK | - |
dc.type.journalArticle | Review | - |
dc.subject.keywordAuthor | colloids | - |
dc.subject.keywordAuthor | lithography | - |
dc.subject.keywordAuthor | nanomaterials | - |
dc.subject.keywordAuthor | patterning | - |
dc.subject.keywordAuthor | self-assembly | - |
dc.subject.keywordPlus | MONODISPERSE SILICA PARTICLES | - |
dc.subject.keywordPlus | ENHANCED RAMAN-SCATTERING | - |
dc.subject.keywordPlus | ALIGNED CARBON NANOTUBES | - |
dc.subject.keywordPlus | MODEL FILLED POLYMERS | - |
dc.subject.keywordPlus | PERIODIC NANOPILLAR ARRAYS | - |
dc.subject.keywordPlus | EDGE-SPREADING LITHOGRAPHY | - |
dc.subject.keywordPlus | SURFACE-PLASMON RESONANCE | - |
dc.subject.keywordPlus | NANOSPHERE LITHOGRAPHY | - |
dc.subject.keywordPlus | ELECTRIC-FIELD | - |
dc.subject.keywordPlus | DISPERSION POLYMERIZATION | - |
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